Vertical in-line coating plant for developing layer systems and technologies for the deposition of optical, electrical and decorative functional layers.

The ILA 900 in-line sputtering plant allows layers and layer systems to be  applied to flat substrates of size up to 1200 × 600 × 60 millimeters. The plant is designed in a way that up to eight processing stations can be used to deposit metals and metal oxides / nitrides / oxynitrides reactively or from ceramic targets via unipolar or bipolar magnetron sputtering. This can be carried out on either one side or both sides.

Typical substrate

• single-sided or two-sided coating of substrates made of metal, plastic, glass or ceramics with substrate dimensions up to 1200 × 900 mm² and a maximum thickness of 60 mm (maximum homogenous coating width 600 mm)

Range of applications

• development and testing of technological components and key components for the deposition of metals and oxides under near- industrial conditions
• development of optical, electrical, decorative functional layers and layer systems
• coatings: 
• for special studies/tests
• for marketing purposes
• for samples for final customers
• pilot production
• evaluation of the economics of the processes