Batch plant for coating 3-D substrates

Very versatile production-scale plant equipped with:

• two dual magnetron systems with 50 kW pulsed voltage supplies
• a hollow cathode source for additional plasma generation
• a pulsed voltage source for plasma pre-treatment/treatment
• a unit for heating the substrate up to 700°C
• 1-, 2- or 3-fold substrate rotation
• devices for process control, data recording and plasma diagnostics

Typical substrate

• coating of substrates having 3-D geometries with typical dimensions of
  10 × 10 × 10 mm³ up to a maximum of 500 × 500 × 500 mm³

Range of applications

• development of layers, technology and processes
• feasibility studies
• preparation of sample coatings
• small series coating
• testing technological components