Spin coating is used for many applications where a flat substrate is coated with thin layers of materials. The coating solution is deposited onto the surface and spun-off to leave a uniform layer for subsequent processing stages or the ultimate use. The coating of a substrate with specific materials can be used to generate highly tailored surfaces for cell culture or to define structured surfaces and microfluidic devices.

The Laurell WS-650Hzb-23NPP-UD-3 spin coaters, accomodate up to 150 mm wafers and 5”x5” substrates. They are equipped with three automatic dispensers and feature a maximum rotation speed of 12.000 rpm and acceleration up to 30K rpm/sec. The control of the motor mode rotation (clockwise, counterclockwise, puddle), in combination with the three automatic dispensers, allows to obtain an uniform deposition of multilayer thin films and to perform photoresist development. These features enable a quick work optimization with fully automatic processes and high reproducibility.