Thermal evaporator Kurt J. Lesker Company® NANO 36™
Informationen
Name: | Thermal evaporator | |
Hersteller: | Kurt J. Lesker Company® | |
Modell: | NANO 36™ | |
Einrichtung: | Microstructure Facility (MSF) | |
Partner: | Technische Universität Dresden (TUD) | |
Standort: | Room 3.130 |
Beschreibung
Thermal evaporation is one of the widely used techniques of physical vapor deposition (PVD). It is a type of thin film deposition technique, where a solid material is evaporated by heating. The vapor stream rises from the bottom source and reaches the substrates, depositing on its surface. The deposited films usually have a thickness in the range of angstroms to microns and are composed of a single material or layers of multiple materials.
The thermal evaporator Nano 36 from Kurt J-Lesker allows the coatings and deposition of multilayer thin films of metals with a control on the sub-nanometric scale. It is equipped with: i) a vacuum chamber able to load a single 8" wafer or multiple smaller substrates; ii) three evaporation sources for multilayer deposition; iii) a quartz crystal sensor, that in conjunction with a thin film controller (FTC-2000), ensures an automatic control of the film thickness. Furthermore the substrate and source shutter and the motorized rotation of the sample holder ensure a uniform deposition on the entire surface of the substrate. Thermal evaporation, in combination with photolithography and lift off processes, allows the fabrication of microelectrodes for the development of electrochemical biosensor.
Link zu weiteren Informationen
http://www.lesker.com/newweb/vacuum_systems/deposition_systems_pvd_nano36.cfm?ref=tech
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Letztes Update
Zuletzt aktualisiert am: 13. Juli 2017 um 11:54:13