Direct Laser Interference Patterning (DLIP)

This system is capable to directly structure materials using Direct Laser Interference Patterning technology (DLIP). The 2 and 4 laser beam interference is realised using heads, produced by Fraunhofer IWS. The formed interference intensity profile is used to directly ablate the material surface, producing line-like, pillar-like and dot-like structures. The specially design optical setups inside the DLIP heads and the system itself provides the ability to change the period and the area of the interference profile.

Laser

Picosecond laser from neoLASE GmbH is used in this system. The laser emits fundamental (λ=1064nm) and second harmonic (λ=532nm) radiation providing the ability to structure wider range of materials. The repetition rate and energy of the pulses can be changed during the ongoing process.

Positioning stages

The XY and vertical Z positioning stages from Aerotech GmbH is used to move the samples in respect to the laser spot and to control the vertical position of the interference spot respectively.

Components

• DLIP Kopf: Fraunhofer IWS
• Achsen: Aerotech GmbH
• Laser: NeoLASE