View all instruments of this unit Low-Pressure Chemical Vapor Deposition (LP-CVD) Centroterm E1550 HT 320-4
Basic Information
| Name: | Low-Pressure Chemical Vapor Deposition (LP-CVD) | |
| Manufacturer: | Centroterm | |
| Model: | E1550 HT 320-4 | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
|
| Inventory number: | CVD01-LP | |
Description
LP-CVD is a process to deposit thin films on substrates at low pressures. This technique relies on thermally driven reactions to form the desired film on the substrate.
Possible application for LP-CVD are:
- Poly-silicon for Trench Fill / Sacrifcial Layer
- Silicon Oxide for Insulator, Membranes
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Depostion of Material on Wafer |
Last Update
Last updated at: 14 January 2025 at 10:42:29