View all instruments of this unit Gas Phase Release Techniques KLA Monarch and Xetch
Basic Information
| Name: | Gas Phase Release Techniques | |
| Manufacturer: | KLA | |
| Model: | Monarch and Xetch | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
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| Inventory number: | GPE01, GPE02 | |
Description
Gas Phase Release Techniques involve the use of gases to selectively etch or deposit materials on wafers.
- HF-GPE for SiO2
- XeF2 for a-Si X-SYS-3B:6
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Last Update
Last updated at: 14 January 2025 at 12:59:44