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Roll-to-Roll Nanoimprint Lithography Coatema Basecoater BC 51

Basic Information

Name: Roll-to-Roll Nanoimprint Lithography
Manufacturer: Coatema
Model: Basecoater BC 51
Facility: Chair of Laser-based Manufacturing
Partner: Technische Universität Dresden (TUD)
Partner: Fraunhofer Institute for Material and Beam Technology (IWS)
Inventory number: 25144653

Description

UV-NIL mode:

In UV Nanoimprint Lithography (NIL), the substrate is coated with a UV curable resist, which is imprinted by a mold and subsequently cured using UV light. In this way, an inverse structure of the mold is created.

Thermal-NIL mode:

During thermal-NIL, the structured rollers is heated above the glass transition temperature (Tg) and pressed against the counter roller while rotating, thereby transferring the inverse structure to the thermoplastic polymer.

 

Process Parameter UV-NIL Thermal-NIL
Imprint temperature up to 120 °C up to 160 °C
Pre-bake temperature up to 200 °C up to 200 °C
Line pressure up to 72 N/mm² up to 200 N/mm²
Web speed 1-50 m/min 1-50 m/min
Foil width 250 mm 250 mm
UV-lamp power 140 W/cm²  

 

Points of Contact

Prof. Dr.-Ing. Andrés F. Lasagni / Mrs. Lisa Becher (Sec.)
Email:
Phone:
+49 351 463-37844
Fax:
+49 351 463-37755

Images

Last Update

Last updated at: 12 September 2018 at 11:47:49