Roll-to-Roll Nanoimprint Lithography Coatema Basecoater BC 51
Basic Information
Name: | Roll-to-Roll Nanoimprint Lithography | |
Manufacturer: | Coatema | |
Model: | Basecoater BC 51 | |
Facility: | Chair of Laser-based Manufacturing | |
Partner: | Technische Universität Dresden (TUD) | |
Partner: | Fraunhofer Institute for Material and Beam Technology (IWS) | |
Inventory number: | 25144653 |
Description
UV-NIL mode:
In UV Nanoimprint Lithography (NIL), the substrate is coated with a UV curable resist, which is imprinted by a mold and subsequently cured using UV light. In this way, an inverse structure of the mold is created.
Thermal-NIL mode:
During thermal-NIL, the structured rollers is heated above the glass transition temperature (Tg) and pressed against the counter roller while rotating, thereby transferring the inverse structure to the thermoplastic polymer.
Process Parameter | UV-NIL | Thermal-NIL |
Imprint temperature | up to 120 °C | up to 160 °C |
Pre-bake temperature | up to 200 °C | up to 200 °C |
Line pressure | up to 72 N/mm² | up to 200 N/mm² |
Web speed | 1-50 m/min | 1-50 m/min |
Foil width | 250 mm | 250 mm |
UV-lamp power | 140 W/cm² |
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Last Update
Last updated at: 12 September 2018 at 11:47:49