View all instruments of this unit Deep Ultraviolet (DUV)- Lithography Nikon NSR-S210D and NSR-2205i 1E2
Basic Information
| Name: | Deep Ultraviolet (DUV)- Lithography | |
| Manufacturer: | Nikon | |
| Model: | NSR-S210D and NSR-2205i 1E2 | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
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| Inventory number: | DUV01 and ILINE01 | |
Description
Deep Ultraviolet (DUV) lithography is used to transfer circuit patterns onto wafers with high precision. This process involves using ultraviolet light with wavelengths of for example 365 nm , 193 nm or 248 nm, to create microscopic circuit elements that form the basis of modern integrated circuits.
DUV for 130 nm l/s and i-Line for 400 nm l/s
Options of instrument usage
- This instrument can be used with the support of a supervising assistant.
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Lithography for wafers |
Last Update
Last updated at: 14 January 2025 at 09:23:33