View all instruments of this unit Atomic Layer Deposition (ALD) Picosun; SPTS P-300; MVD 300 Batch Reactor
Basic Information
| Name: | Atomic Layer Deposition (ALD) | |
| Manufacturer: | Picosun; SPTS | |
| Model: | P-300; MVD 300 Batch Reactor | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
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| Inventory number: | ALD01; ALD02 | |
Description
Atomic Layer Depostion is possible with two different Instruments.
- SiO2, Al2O3 (P-300; Picosun)
- FDTS for Anti-Stiction (MVD 300 Batch Reactor, SPTS)
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Depostion of Material on Wafer |
Last Update
Last updated at: 14 January 2025 at 10:22:54