View all instruments of this unit Sputtering (PVD) von Ardenne Anlagentechnik; SPTS CS400S; Sigma 204
Basic Information
| Name: | Sputtering (PVD) | |
| Manufacturer: | von Ardenne Anlagentechnik; SPTS | |
| Model: | CS400S; Sigma 204 | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
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| Inventory number: | PVD02; PVD03; PVD04 | |
Description
Sputtering is a physical vapor deposition (PVD) technique where atoms are ejected from a solid target material due to bombardment by energetic particles and then deposited onto a substrate to form a thin film. We offer this instrument for different processes:
- Chemical Sensors and Barriers (Ta, Ta2O5, Nb, Nb2O5)
- Mirrors and Hinges (Al, TiAl, Al alloys, Al2O3)
- Interconnects (Al, AlSiCu, Ti, TiN)
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Depostion of Material on Wafer |
Last Update
Last updated at: 14 January 2025 at 10:48:32