View all instruments of this unit Dry etch LAM; SPTS ALLIANCE 9600PTX; Omega fxP
Basic Information
| Name: | Dry etch | |
| Manufacturer: | LAM; SPTS | |
| Model: | ALLIANCE 9600PTX; Omega fxP | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
|
| Inventory number: | RIE02, RIE04, RIE05 | |
Description
Dry etching is a process that uses gases or plasmas to remove material from the surface of a wafer, allowing for precise patterning and etching of intricate features.
- Metal etch (Al / Al alloys)
- Dielectrics & Poly Etch (SiO2, Si3N4, PolySi, a-Si)
- Deep silicon etch
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Etching and cleaning of wafers |
Last Update
Last updated at: 14 January 2025 at 12:51:16