View all instruments of this unit Ashing tfd;Tryman GIGAbatch 380M; NEO2232
Basic Information
| Name: | Ashing | |
| Manufacturer: | tfd;Tryman | |
| Model: | GIGAbatch 380M; NEO2232 | |
| Facility: | 200 mm MEMS-Cleanroom | |
| Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
|
| Inventory number: | ASH06; ASH07 | |
Description
Ashing is a semiconductor process used to remove photoresist or other organic materials from the wafer surface by exposing it to a plasma or reactive gas, effectively cleaning the wafer for subsequent processing steps.
We offer Ashing resist.
Options of instrument usage
- This instrument is used within a service or research collaboration.
Points of Contact
Associated Services
| Name | Preview | Actions |
|---|---|---|
| Etching and cleaning of wafers |
Last Update
Last updated at: 14 January 2025 at 13:11:06