High-k Devices (Group)
of the Center Nanoelectronic Technologies (CNT)Parent Units:
Fraunhofer Institute for Photonic Microsystems (IPMS)
Contact
web: | http://www.screening-fab.com/en/ald-center.html | |
phone: | +49 351 2607-3040 | |
fax: | +49 351 2607-3005 | |
address: | Fraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies, High-k Devices, Königsbrücker Str. 178, 01099 Dresden, Germany | |
Center: | Center Nanoelectronic Technologies (CNT) | |
partner: | Fraunhofer Institute for Photonic Microsystems |
Expertise
The “High-k Devices” focus group develops technologies for the integration of high-k materials into microchips and offers the entire value-adding chain from chemical precursors, material screening, process development, reliability testing right through to pilot production. There is a particular focus on Atomic Layer Deposition (ALD).
The Center Nanoelectronic Technologies is also co-founder of the competence center for Atomic Layer Deposition - ALD Lab Dresden, an association of 8 institutes for a comprehensive expertise and capabilities in the field of ALD. Furthermore, the High-k group is working on ferroelectric memories and materials such as hafnium, zirconium, strontium, ruthenium or tantalum for the application on 300 mm wafer.
instruments
View instruments (1)Affiliations
Parent Units
name |
type |
actions |
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Center Nanoelectronic Technologies (CNT) | Center | view |
Last Update
Last updated at: 2016-07-14 07:58 CEST