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web: http://www.screening-fab.com/en/ald-center.html
phone: +49 351 2607-3040
fax: +49 351 2607-3005
address: Fraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies, High-k Devices, Königsbrücker Str. 178, 01099 Dresden, Germany
Center: Center Nanoelectronic Technologies (CNT)
partner: Fraunhofer Institute for Photonic Microsystems


The “High-k Devices” focus group develops technologies for the integration of high-k materials into microchips and offers the entire value-adding chain from chemical precursors, material screening, process development, reliability testing right through to pilot production. There is a particular focus on Atomic Layer Deposition (ALD).

The Center Nanoelectronic Technologies is also co-founder of the competence center for Atomic Layer Deposition - ALD Lab Dresden, an association of 8 institutes for a comprehensive expertise and capabilities in the field of ALD. Furthermore, the High-k group is working on ferroelectric memories and materials such as hafnium, zirconium, strontium, ruthenium or tantalum for the application on 300 mm wafer.


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Center Nanoelectronic Technologies (CNT) Center view

Last Update

Last updated at: 2016-07-14 07:58