PVD and Nanotechnology (Division)Parent Units:
Fraunhofer Institute for Material and Beam Technology (IWS)
German name: "PVD- und Nanotechnik".
|phone:||+49 351 83391-3317|
|fax:||+49 351 83391-3314|
|address:||Fraunhofer Institute for Material and Beam Technology (IWS), PVD and Nanotechnology, Winterbergstr. 28, 01277 Dresden, Germany|
|partner:||Fraunhofer Institute for Material and Beam Technology|
The core competence within the business field PVD vacuum coating technology is a broad know-how of physical coating technologies. The spectrum of processes in- cludes the fabrication of ultra precise multilayer stacks using magnetron and ion beam sputtering techniques, various processes to deposit amorphous carbon coatings and high rate deposition techniques.
A central activity is also the deposition of hydrogen-free amorphous carbon coatings (ta-C). Compared to conventional DLC coatings the institute’s ta-C films have a sub- stantially higher hardness and show a significantly improved low friction performance in particular under unlubricated (dry) friction conditions.
In addition to coating deposition know-how the IWS developed a substantial pool of advanced process technologies. These include, for example, pulsed high current vacuum arc processes, various processes for magnetic or electric plasma filtering to reduce particles during the deposition and a vacuum arc based process to produce single wall carbon nanotubes (SWCNT). The institute is also known for its non- destructive laser acoustic measurement system to test thin films.
For further information see brochure.
|Fraunhofer Institute for Material and Beam Technology (IWS)||Institute|
|X-Ray and EUV Optics||Group|
Last updated at: 2015-09-08 12:21