X-ray scattering probes the arrangement of atoms in a sample by utilizing the interference of X-rays scattered at lattice planes or interfaces. It provides information about structural properties (e.g. crystallographic phases, lattice constants, degree of crystallization) and microstructural properties (e.g. grain size, preferred orientation, stress, film thickness, roughness, density). The penetration depth can be varied between a few nanometers and several micrometers. The sensitivity is about 1% phase content. The method allows for non-ambient measurements.

Capabilities

• EPI layer characterization 
• Growth kinetics of e.g. Hf(Si)O₂ films 
• Texture analysis of e.g. tungsten layers showing different CMP behavior 
• Crystallization of of e.g. TiO₂ thin film
• High temperature XRD

This is an instrument within the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA).