Analytics (Facility)of the Center Nanoelectronic Technologies (CNT)
Fraunhofer Institute for Photonic Microsystems (IPMS)
|phone:||+49 351 26 07-3053|
|fax:||+49 351 2607-3005|
|address:||Fraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies, Analytics, Königsbrücker Str. 180, 01099 Dresden, Germany|
|Center:||Center Nanoelectronic Technologies (CNT)|
|partner:||Fraunhofer Institute for Photonic Microsystems|
Fraunhofer IPMS-CNT has established a versatile analytical facility. Our expertise ranges from wafer-level characterization with inline X-ray scattering methods and three-dimensional Atomic Force Microscopy to two- and three-dimensional device characterization with analytical transmission electron microscopy and atom probe tomography.
Our in-line metrology enables us to determine physical and chemical properties of structures on 300 mm wafers with
• X-Ray Scattering
• Raman Spectroscopy
• Atom Probe Tomography
• Focussed Ion Beam (FIB)
• Electron Microscopy
• Time-of-Flight Secondary Ion Mass Sprectronomy
• Inline Metrology
All our tools for wafer level analysis are stationed in a class 1000 cleanroom environment that meets industrial standards.
More infos see brochure.
|Center Nanoelectronic Technologies (CNT)||Center|
Last updated at: 2017-02-06 07:08 CET