Focused Ion Beam is an essential tool in modern physical failure analysis. A finely focused ion beam allows for precise cutting into a sample. This tool is indispensable for the site-specific preparation of TEM lamellae and EBSD/TKD samples. FIB tools nowadays are usually dual-beam machines equipped with both an ion beam column and an electron beam column; hence images with electrons and ions can be taken in parallel. In addition our tool is equipped with a micromanipulator and a platinum, as well as a carbon gas injection system allowing for local deposition of platinum and carbon respectively. As a result the apparatus can furthermore be utilized for nanolithography and circuit modification.

Capabilities

• Preparation of electron transparent lamellae for TEM or TKD
• Ion beam imaging
• Preparation of cross-section cuts of wafers for evaluation e.g. deposition & etching regimes as well as failure analysis

This is an instrument within the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA).