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TOF-SIMS ION-TOF GmbH TOF.SIMS 300R

Basic Information

Name: TOF-SIMS
Manufacturer: ION-TOF GmbH
Model: TOF.SIMS 300R
Facility: Analytics of the Center Nanoelectronic Technologies (CNT)
Partner: Fraunhofer Institute for Photonic Microsystems (IPMS)

Description

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.

 

The IONTOF TOF.SIMS 300 R provides clean room compatible, automated 300 mm wafer handling, analysis and data reduction with high stability and performance


Measure/Resolution:

  • Depth resolution:1-10 nm
  • Sputtered Area:(2-500 μm)²
  • Lateral resolution:<100nm
  • Mass resolution:up to 7000
  • Mass range:1-10.000 amu
  • Primary Ions:Cs+   250eV – 2keV
  • O2+   500 eV – 2keV
  • Bi+, Bi3+  25keV
  • Temperature:~20°C
  • Pressure (UHV):1e-10 mbar  - 1e-8 mbar
  • Sample Size:up to 300 x 300 mm
  • Environment:Cleanroom, Class 1000
  • static and dynamic SIMS

 

Accessory/Options:

LMIG (Bi), DSC (Cs, O)

Link to Further Details

https://www.iontof.com/tof-analyser-tof-sims-5.html

Points of Contact

Dr. Wenke Weinreich
Phone:
+49 351 26 07-3053
Fax:
+49 351 2607-3005

Notes

This is an instrument within the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA).

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Last Update

Last updated at: 13 July 2017 at 11:54:12