Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.

The IONTOF TOF.SIMS 300 R provides clean room compatible, automated 300 mm wafer handling, analysis and data reduction with high stability and performance

Measure/Resolution:

• Depth resolution:1-10 nm
• Sputtered Area:(2-500 μm)²
• Lateral resolution:<100nm
• Mass resolution:up to 7000
• Mass range:1-10.000 amu
• Primary Ions:Cs+   250eV – 2keV
• O2+   500 eV – 2keV
• Bi+, Bi3+  25keV
• Temperature:~20°C
• Pressure (UHV):1e-10 mbar  - 1e-8 mbar
• Sample Size:up to 300 x 300 mm
• Environment:Cleanroom, Class 1000
• static and dynamic SIMS

Accessory/Options:

LMIG (Bi), DSC (Cs, O)

This is an instrument within the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA).