TOF-SIMS ION-TOF GmbH TOF.SIMS 300R
Basic Information
Name: | TOF-SIMS | |
Manufacturer: | ION-TOF GmbH | |
Model: | TOF.SIMS 300R | |
Facility: | Analytics of the Center Nanoelectronic Technologies (CNT) | |
Partner: | Fraunhofer Institute for Photonic Microsystems (IPMS) |
Description
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.
The IONTOF TOF.SIMS 300 R provides clean room compatible, automated 300 mm wafer handling, analysis and data reduction with high stability and performance
Measure/Resolution:
- Depth resolution:1-10 nm
- Sputtered Area:(2-500 μm)²
- Lateral resolution:<100nm
- Mass resolution:up to 7000
- Mass range:1-10.000 amu
- Primary Ions:Cs+ 250eV – 2keV
- O2+ 500 eV – 2keV
- Bi+, Bi3+ 25keV
- Temperature:~20°C
- Pressure (UHV):1e-10 mbar - 1e-8 mbar
- Sample Size:up to 300 x 300 mm
- Environment:Cleanroom, Class 1000
- static and dynamic SIMS
Accessory/Options:
LMIG (Bi), DSC (Cs, O)
Link to Further Details
Points of Contact
Notes
This is an instrument within the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA).
Images
Last Update
Last updated at: 13 July 2017 at 11:54:12