270 results
Shaping
Facility: Materials Center
Using innovative shaping technology we will produce rod shaped or spherical beads from your material already at gram scale.
Nitrogen Physisorption Measurements
Facility: Materials Center
We will conduct low temperature nitrogen physisoption measurements including the evaluation according to BET- and Langmuir theory.
X-Ray Powder Diffraction (XRPD)
Facility: Materials Center
You need a fast and reliable phase analysis and do not have the opportunity to measure it by yourself? We will provide you with XRPD measurements based on only 15 mg of material.
Wafer Coating
Facility: Chair for Semiconductor Technology
Waferbeschichtung - Oxidation, PECVD-, ALD- und PVD-Prozesse für Herstellung funktionaler Schichten und Schichtsysteme, Diffusionsbarrieren, Metallisierungen verschiedener Einsatzbereiche.
Si-deep etching for MEMS, MOEMS and microfluidic
Facility: Chair for Semiconductor Technology
Si-deep etching for MEMS, MOEMS and microfluidic.
Additive and subtractive wiring technology
Facility: Chair for Semiconductor Technology
Additive and subtractive wiring technology - e.g. Damascene structuring.


