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View the profile: 300 mm CMOS Cleanroom

Equipment of 300 mm CMOS Cleanroom

Fraunhofer Institute for Photonic Microsystems
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14 results

 

Wafer Cleaning

Facility: 300 mm CMOS Cleanroom

 

Wafer Plating

Facility: 300 mm CMOS Cleanroom

 

Chemical Mechanical Planarization (CMP)

Facility: 300 mm CMOS Cleanroom

 

Nanopatterning via E-Beam Lithography

Facility: 300 mm CMOS Cleanroom

 

Atomic Layer Deposition (ALD)

Facility: 300 mm CMOS Cleanroom

 

Inline Metrology

Facility: Analytics and Metrology

 

Raman Spectroscopy

Manufacturer: Renishaw
Model: Invia Reflex
Facility: Analytics and Metrology

 
Bruker TXRF-Spectrometer S2 Picofox (Quelle: www.bruker.com)

Light Microscopy

Manufacturer: Zeiss
Model: Zeiss Axio Imager KMAT und Axio Imager.A1m
Facility: Analytics and Metrology

 
FEI Strata 400 STEM (Quelle: www.ims.uconn.edu)

Focused Ion Beam

Manufacturer: FEI Company
Model: Strata 400
Facility: Analytics and Metrology

 
CAMECA LEAP 4000 Si (Quelle: www.cameca.com)

Atomic Force Microscopy (AFM)

Manufacturer: Oxford Instruments
Model: Asylum Research Cypher
Facility: Analytics and Metrology

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