59 results
Evaporation of material on substrate
Manufacturer: Evatec
Model: BAK 761
Facility: 200 mm MEMS-Cleanroom
Sputtering (PVD)
Manufacturer: von Ardenne Anlagentechnik; SPTS
Model: CS400S; Sigma 204
Facility: 200 mm MEMS-Cleanroom
Low-Pressure Chemical Vapor Deposition (LP-CVD)
Manufacturer: Centroterm
Model: E1550 HT 320-4
Facility: 200 mm MEMS-Cleanroom
Plasma-Enhanced Chemical Vapor Deposition (PE-CVD)
Manufacturer: Applied Materials
Model: Centura
Facility: 200 mm MEMS-Cleanroom
Atomic Layer Deposition (ALD)
Manufacturer: Picosun; SPTS
Model: P-300; MVD 300 Batch Reactor
Facility: 200 mm MEMS-Cleanroom
Coating
Manufacturer: tel; Osiris; Süss
Model: SK-80EX, dns& TEL-ACT8 ; Basixx ST20+; VARIXX 806; Gamma80
Facility: 200 mm MEMS-Cleanroom
Preparation for Lithography of wafers
Manufacturer: ap&s
Model: 300 WB-08304
Facility: 200 mm MEMS-Cleanroom
Deep Ultraviolet (DUV)- Lithography
Manufacturer: Nikon
Model: NSR-S210D and NSR-2205i 1E2
Facility: 200 mm MEMS-Cleanroom