59 results
Evaporation of material on substrate
Manufacturer: Evatec Model: BAK 761 Facility: 200 mm MEMS-Cleanroom
Sputtering (PVD)
Manufacturer: von Ardenne Anlagentechnik; SPTS Model: CS400S; Sigma 204 Facility: 200 mm MEMS-Cleanroom
Low-Pressure Chemical Vapor Deposition (LP-CVD)
Manufacturer: Centroterm Model: E1550 HT 320-4 Facility: 200 mm MEMS-Cleanroom
Plasma-Enhanced Chemical Vapor Deposition (PE-CVD)
Manufacturer: Applied Materials Model: Centura Facility: 200 mm MEMS-Cleanroom
Atomic Layer Deposition (ALD)
Manufacturer: Picosun; SPTS Model: P-300; MVD 300 Batch Reactor Facility: 200 mm MEMS-Cleanroom
Coating
Manufacturer: tel; Osiris; Süss Model: SK-80EX, dns& TEL-ACT8 ; Basixx ST20+; VARIXX 806; Gamma80 Facility: 200 mm MEMS-Cleanroom
Preparation for Lithography of wafers
Manufacturer: ap&s Model: 300 WB-08304 Facility: 200 mm MEMS-Cleanroom
Deep Ultraviolet (DUV)- Lithography
Manufacturer: Nikon Model: NSR-S210D and NSR-2205i 1E2 Facility: 200 mm MEMS-Cleanroom


